Optimization of Thin, Nitrogen-Rich Silicon Oxynitrides Grown by Rapid Thermal Nitridation
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چکیده
Optimization of Thin, Nitrogen-Rich Silicon Oxynitrides Grown by Rapid Thermal Nitridation A. Ludsteck, J. Schulze, I. Eisele, W. Dietl, H. Chung, Z. Nenyei,* A. Bergmaier, and G. Dollinger Institute of Physics, EIT, Universität der Bundeswehr München, 85577 Neubiberg, Germany Mattson Thermal Products GmbH, 89160 Dornstadt, Germany Department of Physics, Technische Universität München, 85747 Garching, Germany
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